专利名称：In-Situ Deposition of Film Stacks
发明人：Jason Haverkamp,Pramod Subramonium,Joe
Womack,Dong Niu,Keith Fox,JohnAlexy,Patrick Breiling,Jennifer
O'Loughlin,Mandyam Sriram,George AndrewAntonelli,Bart van Schravendijk
申请号：US12970846申请日：20101216
公开号：US20110236594A1公开日：20110929
专利附图：
摘要：Methods and hardware for depositing film stacks in a process tool in-situ (i.e.,without a vacuum break or air exposure) are described. In one example, a method fordepositing, on a substrate, a film stack including films of different compositions in-situ ina process station using a plasma is described, the method including, in a first plasma-activated film deposition phase, depositing a first layer of film having a first film
composition on the substrate; in a second plasma-activated deposition phase, depositinga second layer of film having a second film composition on the first layer of film; andsustaining the plasma while transitioning a composition of the plasma from the firstplasma-activated film deposition phase to the second plasma-activated film depositionphase.
申请人：Jason Haverkamp,Pramod Subramonium,Joe Womack,Dong Niu,Keith Fox,JohnAlexy,Patrick Breiling,Jennifer O'Loughlin,Mandyam Sriram,George Andrew Antonelli,Bartvan Schravendijk
地址：Clifton Park NY US,Beaverton OR US,Tigard OR US,West Linn OR US,Tigard ORUS,West Linn OR US,Portland OR US,Portland OR US,Beaverton OR US,Portland ORUS,Sunnyvale CA US
国籍：US,US,US,US,US,US,US,US,US,US,US
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