专利名称：Composite resist structures
发明人：Collini, George John,Lopata, Alexander
Daniel
申请号：EP86114968.0申请日：19861028公开号：EP022A2公开日：19870616
摘要：A composite resist structure having a first underlayer of an aqueous alkalinesoluble positive photoresist composition and a second, top layer comprised of thereaction product of a novolak type phenol-formaldehyde resin and a 1,2-‐naphthoquinone-2-diazidio-4-sulfonyl chloride.
申请人：International Business Machines Corporation
地址：Old Orchard Road Armonk, N.Y. 10504 US
国籍：US
代理机构：Klein, Daniel Jacques Henri
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