专利名称：Wavefront aberration measuring method,
mask, wavefront aberration measuringdevice, exposure apparatus, and devicemanufacturing method
发明人：Chidane Ouchi,Masanobu Hasegawa,Seima
Kato
申请号：US12391918申请日：20090224公开号：US08077391B2公开日：20111213
专利附图：
摘要：A wavefront aberration measuring device includes a mask placed in an objectplane of a to-be-tested optical system and having a pattern including a pinholeproducing a spherical wave and adjoining diffraction gratings each ruled with linesoriented in a direction different from the other; an illumination optical system thatilluminates an area of the mask with light emitted from a light source; a light splitter thatsplits the light from the pattern transmitted through the to-be-tested optical system; animage pickup unit that takes an image of interference fringes produced by the split light,the image being used in measuring wavefront aberration of the to-be-tested opticalsystem; a detector that detects respective light quantities of respective diffracted beamsfrom the respective illuminated diffraction gratings; and a control unit that controlsalignment of the illuminated area of the mask and the pattern in accordance with adetection result.
申请人：Chidane Ouchi,Masanobu Hasegawa,Seima Kato
地址：Utsunomiya JP,Utsunomiya JP,Utsunomiya JP
国籍：JP,JP,JP
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