专利名称：WAVEFRONT ANALYSIS INSPECTION
APPARATUS AND METHOD
发明人：Meimoun, Elie申请号：EP10748411.5申请日：20100303公开号：EP2403396A1公开日：20120111
摘要：The present invention provides high-resolution wavefront measurementsystems and methods for real-time inspection of optical and geometrical properties ofspecular and transparent objects, the systems of the invention comprising at least oneillumination apparatus, at least one imaging apparatus constructed and configured toimage the object onto an image plane, at least one gradient element disposed at one ofthe aperture stops of the imaging apparatus; and a sensor placed in the image plane ofthe imaging apparatus, wherein the sensor is capable of differentiating between differentareas of the gradient element thereby being adapted to provide real-time optical andgeometrical data of the object.
申请人：Meimoun, Elie
地址：Haim Toren Street 25/9 Jerusalem 97823 IL
国籍：IL
代理机构：Kurig, Thomas
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