Integrated bevel clean chamber

专利名称：Integrated bevel clean chamber发明人：Henry Ho,Lily L. Pang,Anh N.

Nguyen,Alexander N. Lerner

申请号：US108292申请日：20040416

公开号：US20040206375A1公开日：20041021

专利附图：

摘要：A method and apparatus for cleaning the bevel of a semiconductor substrate.The apparatus generally includes a cell body having upstanding walls and a fluid drainbasin, a rotatable vacuum chuck positioned centrally positioned in the fluid drain basin,

and at least 3 substrate centering members positioned at equal radial increments aroundthe rotatable vacuum chuck. The substrate centering members include a verticallyoriented shaft having a longitudinal axis extending therethrough, a cap memberpositioned over an upper terminating end of the shaft, a raised central portion formedonto the cap member, the raised central portion having a maximum thickness at alocation the coincides with the longitudinal axis, and a substrate centering postpositioned on the cap member radially outward of the raised central portion, an upperterminating end of the substrate centering post extending from the cap member to adistance that exceeds the maximum thickness. The apparatus further includes a centeringactuation mechanism in communication with the substrate centering posts, and a fluiddispensing arm pivotally connected to the cell body, the fluid dispensing arm beingconfigured to dispense a processing fluid onto a first side of the substrate.

申请人：APPLIED MATERIALS, INC.

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